Technology

Research from University of Bari yields new data on plasma science

  2009 JUL 7 - (VerticalNews.com) -- "Hydrogen is the main component of many feeding mixtures used for plasma processing. Despite this, the physics and chemistries of the parallel plate, capacitively coupled, radio frequency discharges in pure hydrogen are not yet fully understood," scientists writing in the journal Plasma Processes and Polymers report.

  "The state of the art of the modeling of this system is analyzed, including the problems posed by the electron and ion reactions, the ion heating, the chemistry of excited molecules, the non-equilibrium distributions, the surface catalytic reactions, the double frequency discharge effects. Specific points are illustrated using new results obtained by a self-consistent kinetic model developed in the last 10 years," wrote S. Longo and colleagues, University of Bari.

  The researchers concluded: "A concluding discussion summarizes the achievements and open problems of the field.."

  Longo and colleagues published their study in Plasma Processes and Polymers (Modeling of Capacitively Coupled RF Plasmas in H-2. Plasma Processes and Polymers, 2009;6(5 Sp. Iss.):370-379).

  Additional information can be obtained by contacting S. Longo, University of Bari, Dipartimento Chim, Via Orabona 4, I-70126 Bari, Italy.

  The publisher of the journal Plasma Processes and Polymers can be contacted at: Wiley-V C H Verlag GmbH, PO Box 10 11 61, D-69451 Weinheim, Germany.

  Keywords: Chemicals, Chemistry, Electronics, Radio Frequency, Plasma Science & Technology, University of Bari.

  This article was prepared by VerticalNews Technology editors from staff and other reports. Copyright 2009, VerticalNews Technology via VerticalNews.com.